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- W2034787575 abstract "Elliptical mirrors have been used to image incoherent light sources onto silicon for the purpose of annealing implanted layers. It is found that ∼1 s of illumination is sufficient for annealing areas that approximate the dimensions of the source. Low-dose boron implants are found to be fully activated without any significant diffusive redistribution. Amorphous layers produced by implanting arsenic can be annealed to exhibit minimum yields of ∼4% from back-scattering and give sheet resistivities comparable with thermal annealed values. It is envisioned that the annealing can be expanded to large areas and throughputs by physically moving wafers through the 2 in-long heating strip produced by the present configuration." @default.
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- W2034787575 date "1982-01-01" @default.
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- W2034787575 title "Implantation annealing by thermal imaging" @default.
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- W2034787575 doi "https://doi.org/10.1049/el:19820193" @default.
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