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• W2034793663 abstract "We study hydrogen stability and its evolution during thermal annealing in nanostructured amorphous silicon thin films. From the simultaneous measurement of heat and hydrogen desorption, we obtain the experimental evidence of molecular diffusion in these materials. In addition, we introduce a simple diffusion model which shows good agreement with the experimental data." @default.
• W2034793663 created "2016-06-24" @default.
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• W2034793663 date "2009-08-17" @default.
• W2034793663 modified "2023-09-30" @default.
• W2034793663 title "Molecular hydrogen diffusion in nanostructured amorphous silicon thin films" @default.
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• W2034793663 doi "https://doi.org/10.1103/physrevb.80.073202" @default.
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