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• W2034880186 abstract "Much attention is currently being paid to the materials and processes that allow one to directly write or to imprint waveguiding structures and/or diffractive elements for optical integrated circuits by exposure from a source of photons, electrons or ions. Here a brief overview of the results achieved in our laboratories is presented, concerning the fabrication and characterization of optical guiding structures based on different materials and exposure techniques. These approaches include: electron and ion beam writing of waveguides in (poly)-crystalline lithium fluoride, uv-laser printing of waveguides and gratings in photorefractive glass thin films, and fs-laser writing in tellurite glasses. Properties and perspectives of these approaches are also discussed." @default.
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• W2034880186 date "2005-07-07" @default.
• W2034880186 modified "2023-10-16" @default.
• W2034880186 title "Laser irradiation, ion implantation, and e-beam writing of integrated optical structures" @default.
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• W2034880186 doi "https://doi.org/10.1117/12.609231" @default.
• W2034880186 hasPublicationYear "2005" @default.
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