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• W2034921839 abstract "In order to monitor the photoreaction upon VUV synchrotron radiation processing of semiconductor materials, combined with a specially prepared substrate that had a buried metal layer, infrared reflection absorption spectroscopy (IRAS) was developed to carry out in situ detection of chemical changes on the Si or SiO2 surface. Infrared spectra of iron pentacarbonyl and trimethylaluminum adsorbates in submonolayer quantities were obtained. Both molecules were found physisorbing on the SiO2 surface at T < 180 K and the trimethylaluminum adsorbates were found to be dimers. Under UV (λ > 150 nm) or VUV (λ > 1 nm) synchrotron radiation, the adsorbed dimer Al2(CH3)6 was decomposed, leaving methyl-bearing photofragments on the surface. Increasing the surface temperature to above 180 K showed that the photoproducts were still found on the surface, whereas the undecomposed dimer precursors desorbed." @default.
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• W2034921839 date "1994-05-01" @default.
• W2034921839 modified "2023-09-24" @default.
• W2034921839 title "Buried metal layer enhanced infrared reflection absorption spectroscopy for photoreactions induced by synchrotron radiation on SiO2 surfaces" @default.
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• W2034921839 doi "https://doi.org/10.1016/0169-4332(94)90448-0" @default.
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