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• W2034931617 abstract "Reports a degradation in effective channel mobility with increasing degree of nitridation, as much as 50% for electrons, noticeably less for holes. While both hole and electron mobilities are degraded by Coulombic scattering from nitridation-induced fixed charge, the additional mobility degradation for electrons is attributed to a reduction of the mobile electron density by electron trapping in near-interface traps and to additional Coulombic scattering of the remaining channel electrons by the trapped electrons.< <ETX xmlns:mml=http://www.w3.org/1998/Math/MathML xmlns:xlink=http://www.w3.org/1999/xlink>></ETX>" @default.
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• W2034931617 date "1988-10-01" @default.
• W2034931617 modified "2023-09-23" @default.
• W2034931617 title "Inversion layer mobility of MOSFETs with nitrided oxide gate dielectrics" @default.
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• W2034931617 doi "https://doi.org/10.1109/16.7364" @default.
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