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- W2034961942 endingPage "1057" @default.
- W2034961942 startingPage "1054" @default.
- W2034961942 abstract "The main difference between dry and immersion lithography lies in the interactions between the immersion medium and photoresist. For example, it has been shown that resists components as PAG or base additive can leach into water. Such leaching could degrade the resist performances and the optical elements such as scanner lens. Moreover, it could be involved in new defectivity mechanisms as watermark formation. That’s why immersion dedicated resists with low leaching rate or top coat protective layers have been designed for immersion lithography. However, they do not permit to prevent all leaching and there is always some residual amount of PAG extracted through the barrier layer. Even if leaching phenomena is now well understood for conventional resists, some questions are still present concerning PAG leaching through top coats. In this paper, we present a study of PAG leaching mechanisms through top coats. It is based on leaching kinetics analysis by HPLC/MS. As described in the literature, PAG leaching from dry resists into a static water volume has been shown to follow a first order kinetics model, however, in the case of a top coat stack, we observed a very different behaviour. A new model, taking into account both resist and top coat surface leaching has been developed to fit the experimental data. It illustrates the presence of two leaching mechanisms: a fast one from the top coat surface and a slow one from an embedded interface. This model also provides interesting data about the leaching process on immersion dedicated resists." @default.
- W2034961942 created "2016-06-24" @default.
- W2034961942 creator A5008490815 @default.
- W2034961942 creator A5033531330 @default.
- W2034961942 creator A5049800882 @default.
- W2034961942 creator A5052069839 @default.
- W2034961942 creator A5059956962 @default.
- W2034961942 creator A5062194469 @default.
- W2034961942 creator A5065411415 @default.
- W2034961942 creator A5069362962 @default.
- W2034961942 date "2007-05-01" @default.
- W2034961942 modified "2023-09-27" @default.
- W2034961942 title "Leaching mechanisms in immersion lithography with or without top coat" @default.
- W2034961942 cites W1980740881 @default.
- W2034961942 cites W1998653824 @default.
- W2034961942 cites W2017331223 @default.
- W2034961942 cites W2040232211 @default.
- W2034961942 cites W2087099425 @default.
- W2034961942 cites W2097490125 @default.
- W2034961942 doi "https://doi.org/10.1016/j.mee.2007.01.117" @default.
- W2034961942 hasPublicationYear "2007" @default.
- W2034961942 type Work @default.
- W2034961942 sameAs 2034961942 @default.
- W2034961942 citedByCount "11" @default.
- W2034961942 countsByYear W20349619422016 @default.
- W2034961942 countsByYear W20349619422017 @default.
- W2034961942 countsByYear W20349619422018 @default.
- W2034961942 countsByYear W20349619422019 @default.
- W2034961942 countsByYear W20349619422022 @default.
- W2034961942 crossrefType "journal-article" @default.
- W2034961942 hasAuthorship W2034961942A5008490815 @default.
- W2034961942 hasAuthorship W2034961942A5033531330 @default.
- W2034961942 hasAuthorship W2034961942A5049800882 @default.
- W2034961942 hasAuthorship W2034961942A5052069839 @default.
- W2034961942 hasAuthorship W2034961942A5059956962 @default.
- W2034961942 hasAuthorship W2034961942A5062194469 @default.
- W2034961942 hasAuthorship W2034961942A5065411415 @default.
- W2034961942 hasAuthorship W2034961942A5069362962 @default.
- W2034961942 hasConcept C134406635 @default.
- W2034961942 hasConcept C159390177 @default.
- W2034961942 hasConcept C159750122 @default.
- W2034961942 hasConcept C171250308 @default.
- W2034961942 hasConcept C185592680 @default.
- W2034961942 hasConcept C192562407 @default.
- W2034961942 hasConcept C199068039 @default.
- W2034961942 hasConcept C202444582 @default.
- W2034961942 hasConcept C204223013 @default.
- W2034961942 hasConcept C2779227376 @default.
- W2034961942 hasConcept C33923547 @default.
- W2034961942 hasConcept C39432304 @default.
- W2034961942 hasConcept C49040817 @default.
- W2034961942 hasConcept C53524968 @default.
- W2034961942 hasConcept C90982505 @default.
- W2034961942 hasConcept C94263209 @default.
- W2034961942 hasConceptScore W2034961942C134406635 @default.
- W2034961942 hasConceptScore W2034961942C159390177 @default.
- W2034961942 hasConceptScore W2034961942C159750122 @default.
- W2034961942 hasConceptScore W2034961942C171250308 @default.
- W2034961942 hasConceptScore W2034961942C185592680 @default.
- W2034961942 hasConceptScore W2034961942C192562407 @default.
- W2034961942 hasConceptScore W2034961942C199068039 @default.
- W2034961942 hasConceptScore W2034961942C202444582 @default.
- W2034961942 hasConceptScore W2034961942C204223013 @default.
- W2034961942 hasConceptScore W2034961942C2779227376 @default.
- W2034961942 hasConceptScore W2034961942C33923547 @default.
- W2034961942 hasConceptScore W2034961942C39432304 @default.
- W2034961942 hasConceptScore W2034961942C49040817 @default.
- W2034961942 hasConceptScore W2034961942C53524968 @default.
- W2034961942 hasConceptScore W2034961942C90982505 @default.
- W2034961942 hasConceptScore W2034961942C94263209 @default.
- W2034961942 hasIssue "5-8" @default.
- W2034961942 hasLocation W20349619421 @default.
- W2034961942 hasOpenAccess W2034961942 @default.
- W2034961942 hasPrimaryLocation W20349619421 @default.
- W2034961942 hasRelatedWork W1973500313 @default.
- W2034961942 hasRelatedWork W1976044969 @default.
- W2034961942 hasRelatedWork W1992134028 @default.
- W2034961942 hasRelatedWork W1995176944 @default.
- W2034961942 hasRelatedWork W1999981161 @default.
- W2034961942 hasRelatedWork W2006403989 @default.
- W2034961942 hasRelatedWork W2017331223 @default.
- W2034961942 hasRelatedWork W2040232211 @default.
- W2034961942 hasRelatedWork W2049445643 @default.
- W2034961942 hasRelatedWork W2075646314 @default.
- W2034961942 hasVolume "84" @default.
- W2034961942 isParatext "false" @default.
- W2034961942 isRetracted "false" @default.
- W2034961942 magId "2034961942" @default.
- W2034961942 workType "article" @default.