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• W2034972341 abstract "At present, 5x reduction wafer steppers at i-line and Deep UV wavelengths are available for mass production of devices with 0.35 μm design rules. These wafer steppers have all necessary capabilities for economic volume production such as registration accuracy, throughput and focus tolerance. In this paper the evolution and future potential of optical patterning will be discussed. Topics that will be included are: - Progress of the classical lens parameters such as Numerical Aperture (NA), exposure wavelength and field size. - Economical aspects. The high costs of large field lenses are a driving force for future photo composition strategies such as stitching and scanning. - Important improvement in optical projection which can be expected by optimizing elements in the imaging system outside the actual projection lens, such as reticles, special illumination and resists. The ultimate performance that is needed from optical systems in the future, can only be reached by optimizing all elements of this total imaging system. In doing so, it can be expected that a production resolution below 0.15 μm can be realized with optical reduction systems." @default.
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• W2034972341 date "1994-01-01" @default.
• W2034972341 modified "2023-10-14" @default.
• W2034972341 title "Optical lithography: Present status and continuation below 0.25 μm" @default.
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• W2034972341 doi "https://doi.org/10.1016/0167-9317(94)90104-x" @default.
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