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- W2034984981 abstract "We investigated the feasibility of plasmatron sputtering for the manufacture of resistive films and produced stable CrSi layers. Non-reactive sputtering is suitable for films with a sheet resistance of below 500 Ω/□. Sheet resistances of up to 1000 Ω/□ were implemented by partially reactive sputtering. The reproducibility of the process was substantially improved by isolating the target space from the condensation space. This was accomplished with a rate-reducing slit diaphragm and spatially separated intakes for the reactive and inert gases. Near-zero temperature coefficients of resistivity and high long-term stability were obtained by a three-step annealing procedure." @default.
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- W2034984981 date "1982-10-01" @default.
- W2034984981 modified "2023-10-14" @default.
- W2034984981 title "CrSi resistive films produced by magnetron-plasmatron sputtering" @default.
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- W2034984981 doi "https://doi.org/10.1016/0040-6090(82)90511-9" @default.
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