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• W2034991924 abstract "Abstract We report the successful fabrication of vertically-stacked GaAs quantum wires grown on Si substrates by metalorganic chemical vapor deposition. Using a high-resolution scanning electron microscope, GaAs quantum wires of size (11–15 nm) × (83–127 nm) on a V-grooved GaAs/Si substrate were observed. On the U-grooved substrate the quantum wires were not formed. These results indicate that the sharp V-groove with (111)A side-walls plays an important role in the successful formation of GaAs quantum wires. In addition, operation of a low-threshold AlGaAs/GaAs quantum wire laser grown on a V-grooved GaAs/Si substrate with vertically-stacked quantum wires of size (20–21 nm) × (100–260 nm) was demonstrated. A threshold current as low as 9.8 mA was obtained for the 123 μm long laser at room temperature under pulsed conditions. For the continuous-wave operation, the minimum threshold current was 16–20 mA for cavities of length 150–400 μm." @default.
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• W2034991924 date "1994-12-01" @default.
• W2034991924 modified "2023-09-28" @default.
• W2034991924 title "Vertically-stacked GaAs quantum wires grown on Si substrates by metalorganic chemical vapor deposition" @default.
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• W2034991924 doi "https://doi.org/10.1016/0022-0248(94)91134-7" @default.
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