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• W2034998920 abstract "TiN as gate electrode in Si/HfO2/TiN/poly-Si stack is evaluated after the postmetal annealing treatments. Interface reactions are investigated using electron-energy-loss spectroscopy and x-ray photoelectron spectroscopy. The work function of the TiN/poly-Si stack shows strong dependence on the postmetal deposition annealing conditions. The interfacial product in TiN/poly-Si interface is inferred as TiSiN, which is beneficial for the whole high-k stack since TiSiN possesses higher work function compared to TiN and poly-Si." @default.
• W2034998920 created "2016-06-24" @default.
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• W2034998920 date "2008-05-29" @default.
• W2034998920 modified "2023-09-26" @default.
• W2034998920 title "Interface Evolution of TiN/Poly Si as Gate Material on Si/HfO 2 Stack" @default.
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• W2034998920 doi "https://doi.org/10.1088/0256-307x/25/6/073" @default.
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