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• W2035229667 abstract "Abstract The principal techniques for pattern formation in photochemical etching are: (i) image projection; (ii) contact or proximity masking; (iii) direct writing; (iv) optical (holographic) interference; (v) patterned pre-etch substrate modification. The applicability of each for a particular purpose is determined both by the intrinsic optical characteristics of the pattern forming technique and by the characteristics of the specific etching process." @default.
• W2035229667 created "2016-06-24" @default.
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• W2035229667 date "1992-10-01" @default.
• W2035229667 modified "2023-09-27" @default.
• W2035229667 title "Pattern formation techniques in photochemical etching" @default.
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• W2035229667 doi "https://doi.org/10.1016/0040-6090(92)90925-2" @default.
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