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- W2035355085 abstract "Metal–semiconductor–metal photodetectors with electrode spacing of 0.5 μm have been fabricated on polysilicon films formed by low-pressure chemical vapor deposition. The detectors give a responsivity of 8 mA/W at 980 nm, and a 3-dB bandwidth of 1.5 GHz. Steady-state and transient photoresponse both appear to be limited by recombination and trapping at energy levels within the forbidden gap." @default.
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- W2035355085 date "2002-05-01" @default.
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- W2035355085 title "Submicron, high speed complementary metal–oxide semiconductor compatible metal–semiconductor–metal photodetector" @default.
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- W2035355085 doi "https://doi.org/10.1116/1.1475981" @default.
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