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- W2035497538 abstract "Abstract Silicon carbide epitaxial layers were grown from the vapour phase at 2050–2500 K by the sublimation technique. Films 0.02-0.1 mm thick have been grown. It is found that in the 2320–2420 K range the conditions stabilizing film growth of 6H-SiC polytype are realized independently of substrate polytype. Excessive donor concentration in the growth layers amounted to (2–10) × 10 17 cm -3 with the degree of compensation as high as 50%." @default.
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- W2035497538 date "1976-07-01" @default.
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- W2035497538 title "Silicon carbide epitaxial growth from the vapour phase and properties of epitaxial layers" @default.
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- W2035497538 doi "https://doi.org/10.1016/0022-0248(76)90143-3" @default.
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