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- W2035608927 abstract "Pseudomorphic metastable Ge 0.06 Si 0.94 layers grown by molecular beam epitaxy (MBE) on Si (100) substrates were implanted at room temperature by 70 keV BF 2 ions with two different doses of 3 ×10 13 and 2.5 ×10 14 cm -2 , or by 16 keV B ions with a dose of 4 ×10 14 cm -2 . The implanted samples were subsequently annealed at 800 and 900°C for 30 min in a vacuum tube furnace. Observed by 2 MeV 4 He channeling spectrometry before annealing, only the sample implanted at a dose of 2.5 ×10 14 BF 2 cm -2 is amorphized from surface to a depth of about 90 nm. Crystalline degradation of post-annealed Ge 0.06 Si 0.94 samples becomes pronounced as the dose increases. Even though the both samples implanted with 3 ×10 13 BF 2 cm -2 and 4 ×10 14 B cm -2 initially show almost the same levels of radiation damage in the channeling spectra, the sample implanted at 3 ×10 13 BF 2 cm -2 only conserves the same crystalline quality as the as-grown GeSi after being annealed. It is concluded that such a low dose of 3 ×10 13 BF 2 cm -2 can be doped by implantation without causing radiation or strain-induced defects in the pseudomorphic GeSi." @default.
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- W2035608927 title "Effects of BF<sub>2</sub> and B Implantation-Doping on Crystalline Degradation of Pseudomorphic Metastable Ge<sub>0.06</sub>Si<sub>0.94</sub>" @default.
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- W2035608927 doi "https://doi.org/10.1143/jjap.37.6977" @default.
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