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• W2035759478 abstract "The roughness evolution during plasma deposition of amorphous hydrogenated carbon (a-C:H) films is investigated. Films were deposited from an inductively coupled methane plasma using a wide range of process parameters. Plasma deposition is uniquely described by the dissipated energy per source gas molecule Emean. Depending on Emean, a specific set of radicals contributes to film growth causing a characteristic roughness development. The film roughness is measured using atomic force microscopy and spectroscopic ellipsometry and is expressed using the static and dynamic scaling coefficients α and β, respectively. For low Emean&lt;20eV, α∼0.65 and β∼0.19 indicating film deposition via a growth precursor with a large surface diffusion length. For Emean&gt;20eV, α∼0.9 and β∼0.25 indicating film deposition via a growth precursor with a small surface diffusion length." @default.
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• W2035759478 date "2006-09-01" @default.
• W2035759478 modified "2023-09-24" @default.
• W2035759478 title "Roughness evolution during a-C:H film growth in methane plasmas" @default.
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• W2035759478 doi "https://doi.org/10.1063/1.2266156" @default.
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