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- W2035770973 abstract "It has been shown that pulse-plating galvanization, using a mask of photoresist, can be employed to produce partial deposition of relatively stress-free gold with extremely fine grain sizes and layer thicknesses of up to 7m. The “working window” in which a fine grain size deposition is combined with good permanency of size amounts to 6–12 mA cm−2. Densities of up to ρ = 19.1 g cm−3 are achieved. These layers exhibit microhardness values of 90±20 (Vickers), and carbon contamination is at the detection limit of the X-ray electron microprobe. The electrical resistivity ρ has been measured down to 2.8cm, and from that value the thermal conductivity κT can be calculated as 2.53 W cm−1 K−1 at 300 K. The compressive stress after annealing amounts to − 1.5 × 108 dyn cm−2." @default.
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- W2035770973 date "1989-02-01" @default.
- W2035770973 modified "2023-09-25" @default.
- W2035770973 title "Characterization of gold layers selectively plated by a pulsed current" @default.
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- W2035770973 doi "https://doi.org/10.1016/s0040-6090(89)80009-4" @default.
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