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• W2035902456 endingPage "1597" @default.
• W2035902456 startingPage "1597" @default.
• W2035902456 abstract "Vacancy-type defects in 2-MeV B + -, 2-MeV P + - and 3-MeV As + -ion implanted Si(100) were studied by a monoenergetic positron beam. The depth distributions of vacancy-type defects were obtained from measurements of Doppler broadening profiles of the positron annihilation as a function of incident positron energy. The dominant defect species were identified as vacancy-clusters from their characteristic values of the lineshape parameter S . From isochronal annealing experiments for the P + -implanted specimen, two types of oxygen-vacancy complexes were found to coexist even after 1200°C annealing." @default.
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• W2035902456 date "1991-08-01" @default.
• W2035902456 modified "2023-10-16" @default.
• W2035902456 title "Defects Introduced by MeV-Energy Ion Implantation into Si Probed by a Monoenergetic Positron Beam" @default.
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• W2035902456 doi "https://doi.org/10.1143/jjap.30.1597" @default.
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