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- W2035956424 abstract "Due to their small dimensions when used for visible light, the patterning of photonic crystals has only been possiblewith costly electron beam lithography and low throughput R&D and pilot production grade imprint lithography. Thispaper will focus on results from a high throughput imprint tool capable of processing over 20 wafers per hour on 50-100mm sapphire, GaAs, SiC, Ge and metal substrates. An overview of the process used as well as the results ofpatterning photonic crystal patterns on sapphire wafers and etching them into a SiO2 hard mask will be presented.Finally an analysis of the cost of ownership which currently stands at ~ $20/wf (<$0.01/mm2 for 50mm wafers) will bepresented and opportunities for improvement discussed." @default.
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- W2035956424 date "2006-08-31" @default.
- W2035956424 modified "2023-09-25" @default.
- W2035956424 title "2D photonic crystal patterning for high-volume LED manufacturing" @default.
- W2035956424 doi "https://doi.org/10.1117/12.681481" @default.
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