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- W2036046493 abstract "Abstract The influence of the hydrogen ion implantation on the optical parameters of the SiO 2 /Si system in relation to results from electrical characterization is investigated. Theoretical ellipsometric modeling shows that separate spectral regions and proper angles of incidence can be found, where the optical parameters of the oxide, interface as well as the Si substrate can be studied without high correlation of the respective parameters. From multiple-angle ellipsometric measurements it is established that the introduction of hydrogen increases the refractive index and the extinction coefficient of the Si substrate. This result is linked with the observed increase of the substrate doping level. The increased refractive index of the oxide upon implantation, and consequently, the mechanical stress, are correlated with electrically active radiation defects in the interface region." @default.
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- W2036046493 date "2000-08-01" @default.
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- W2036046493 title "Effect of hydrogen ion implantation on the physical properties of SiO2/Si system" @default.
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- W2036046493 doi "https://doi.org/10.1016/s0042-207x(00)00165-2" @default.
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