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- W2036294561 abstract "Epitaxial TlBa2CaCu2O7 thin films have been grown on single-crystal LaAlO3 and NdGaO3 substrates by in situ off-axis magnetron sputtering in the presence of Tl2O vapor. X-ray diffraction shows that the films are highly epitaxial with the c axis perpendicular to the substrate surface and [100] TlBa2CaCu2O7 aligned with pseudo-cubic [100] NdGaO3 and LaAlO3. The full width at half maximum of the rocking curve for the best films is 0.2°. X-ray diffraction finite size effects show that the film surface is smooth to within several unit cells (∼40 Å). The films are superconducting as deposited with a Tc (onset) of about 80 K and a Tc (R=0) of about 8 K. In situ oxygen treatment of the films at 675 °C has produced films with a Tc(R=0) as high as 40 K. Ex situ annealing in O2 and Tl2O vapor at 800 °C has produced films with a Tc(R=0) as high as 97 K while still retaining a very smooth surface." @default.
- W2036294561 created "2016-06-24" @default.
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- W2036294561 date "1992-10-12" @default.
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- W2036294561 title "<i>In</i> <i>situ</i> growth of epitaxial TlBa2CaCu2O7 thin films" @default.
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- W2036294561 doi "https://doi.org/10.1063/1.108391" @default.
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