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- W2036645295 abstract "In the field of lithography technology, EUV lithography can be a leading candidate for sub-30 nm technology node. EUVL expose system has different characteristics compared to DUV exposure system. EUV source wavelength is short and no material is transparent to the source. So off-axis reflective optic system is used for patterning in place of on-axis refractive system of DUV system. And different reticle design is needed that consists of 40 pair of Mo/Si multi layer and absorber layer in place of conventional mask. Because of the oblique incidence on the mask, shadowing effect is occurred such as pattern asymmetry, shift and pattern bias depending on pattern orientation. For non-telecentric characteristics of EUV scanner, shadowing effect produces CD variation versus field position[1][2]. Besides, it is well known that EUV scanner has bigger flare than conventional DUV scanner. Therefore, the correction of mask shadowing effect and flare level are one of the important issues for EUV lithography. In this paper, process window and MEF of EUV lithography has been examined by 3D mask simulation. CD variation by shadowing is simulated for various pattern orientations. A shadowing correction method has been calculated due to field position to reduce shadowing effect. And the correction effect is examined by simulation and Experimental results. Principle of radial overlay shift due to field position is verified then the shift length of line and space pattern is calculated." @default.
- W2036645295 created "2016-06-24" @default.
- W2036645295 creator A5009614473 @default.
- W2036645295 creator A5015975179 @default.
- W2036645295 creator A5016016364 @default.
- W2036645295 creator A5022325521 @default.
- W2036645295 creator A5029076069 @default.
- W2036645295 creator A5034969749 @default.
- W2036645295 creator A5036321885 @default.
- W2036645295 creator A5042867486 @default.
- W2036645295 creator A5047237667 @default.
- W2036645295 creator A5051515138 @default.
- W2036645295 creator A5059606920 @default.
- W2036645295 creator A5064801483 @default.
- W2036645295 creator A5077633848 @default.
- W2036645295 creator A5081605668 @default.
- W2036645295 creator A5019782144 @default.
- W2036645295 date "2009-03-13" @default.
- W2036645295 modified "2023-09-23" @default.
- W2036645295 title "EUV-patterning characterization using a 3D mask simulation and field EUV scanner" @default.
- W2036645295 cites W2011532652 @default.
- W2036645295 cites W2015575626 @default.
- W2036645295 cites W2049324109 @default.
- W2036645295 cites W2063416595 @default.
- W2036645295 doi "https://doi.org/10.1117/12.814407" @default.
- W2036645295 hasPublicationYear "2009" @default.
- W2036645295 type Work @default.
- W2036645295 sameAs 2036645295 @default.
- W2036645295 citedByCount "4" @default.
- W2036645295 countsByYear W20366452952012 @default.
- W2036645295 crossrefType "proceedings-article" @default.
- W2036645295 hasAuthorship W2036645295A5009614473 @default.
- W2036645295 hasAuthorship W2036645295A5015975179 @default.
- W2036645295 hasAuthorship W2036645295A5016016364 @default.
- W2036645295 hasAuthorship W2036645295A5019782144 @default.
- W2036645295 hasAuthorship W2036645295A5022325521 @default.
- W2036645295 hasAuthorship W2036645295A5029076069 @default.
- W2036645295 hasAuthorship W2036645295A5034969749 @default.
- W2036645295 hasAuthorship W2036645295A5036321885 @default.
- W2036645295 hasAuthorship W2036645295A5042867486 @default.
- W2036645295 hasAuthorship W2036645295A5047237667 @default.
- W2036645295 hasAuthorship W2036645295A5051515138 @default.
- W2036645295 hasAuthorship W2036645295A5059606920 @default.
- W2036645295 hasAuthorship W2036645295A5064801483 @default.
- W2036645295 hasAuthorship W2036645295A5077633848 @default.
- W2036645295 hasAuthorship W2036645295A5081605668 @default.
- W2036645295 hasConcept C105487726 @default.
- W2036645295 hasConcept C120665830 @default.
- W2036645295 hasConcept C121332964 @default.
- W2036645295 hasConcept C146024833 @default.
- W2036645295 hasConcept C146617872 @default.
- W2036645295 hasConcept C14737013 @default.
- W2036645295 hasConcept C159985019 @default.
- W2036645295 hasConcept C160671074 @default.
- W2036645295 hasConcept C162996421 @default.
- W2036645295 hasConcept C192562407 @default.
- W2036645295 hasConcept C204223013 @default.
- W2036645295 hasConcept C2777441419 @default.
- W2036645295 hasConcept C2779227376 @default.
- W2036645295 hasConcept C2779751349 @default.
- W2036645295 hasConcept C49040817 @default.
- W2036645295 hasConcept C520434653 @default.
- W2036645295 hasConcept C53524968 @default.
- W2036645295 hasConceptScore W2036645295C105487726 @default.
- W2036645295 hasConceptScore W2036645295C120665830 @default.
- W2036645295 hasConceptScore W2036645295C121332964 @default.
- W2036645295 hasConceptScore W2036645295C146024833 @default.
- W2036645295 hasConceptScore W2036645295C146617872 @default.
- W2036645295 hasConceptScore W2036645295C14737013 @default.
- W2036645295 hasConceptScore W2036645295C159985019 @default.
- W2036645295 hasConceptScore W2036645295C160671074 @default.
- W2036645295 hasConceptScore W2036645295C162996421 @default.
- W2036645295 hasConceptScore W2036645295C192562407 @default.
- W2036645295 hasConceptScore W2036645295C204223013 @default.
- W2036645295 hasConceptScore W2036645295C2777441419 @default.
- W2036645295 hasConceptScore W2036645295C2779227376 @default.
- W2036645295 hasConceptScore W2036645295C2779751349 @default.
- W2036645295 hasConceptScore W2036645295C49040817 @default.
- W2036645295 hasConceptScore W2036645295C520434653 @default.
- W2036645295 hasConceptScore W2036645295C53524968 @default.
- W2036645295 hasLocation W20366452951 @default.
- W2036645295 hasOpenAccess W2036645295 @default.
- W2036645295 hasPrimaryLocation W20366452951 @default.
- W2036645295 hasRelatedWork W1968505913 @default.
- W2036645295 hasRelatedWork W1986705012 @default.
- W2036645295 hasRelatedWork W1995361396 @default.
- W2036645295 hasRelatedWork W2027095012 @default.
- W2036645295 hasRelatedWork W2031364729 @default.
- W2036645295 hasRelatedWork W2050243074 @default.
- W2036645295 hasRelatedWork W2052805415 @default.
- W2036645295 hasRelatedWork W2085702154 @default.
- W2036645295 hasRelatedWork W2601822073 @default.
- W2036645295 hasRelatedWork W2921363324 @default.
- W2036645295 isParatext "false" @default.
- W2036645295 isRetracted "false" @default.
- W2036645295 magId "2036645295" @default.
- W2036645295 workType "article" @default.