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- W2036660333 abstract "Abstract The surface reconstruction of epitaxial Ge layer on Si(100) was studied with ultrahigh vacuum scanning tunneling microscopy. The surface with 0.8 ML Ge grown in the presence of a hydrogen surfactant reveals the same structures as found in chemical-vapor-deposited Ge on Si(100): (i) defective (2×1) structure at 290°C, (ii) irregular (2×N) in Ge layer and defective (2×1) in bare Si regions at 420°C, and (iii) (2×N) in Ge-covered regions and c(4×4) in bare Si regions at 570°C. The morphology of step edges does not change with temperature, implying that the c(4×4) reconstruction is anisotropic in nature." @default.
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- W2036660333 date "1999-10-01" @default.
- W2036660333 modified "2023-09-27" @default.
- W2036660333 title "Surface reconstructions of the Si(100)–Ge system" @default.
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- W2036660333 doi "https://doi.org/10.1016/s0039-6028(99)00842-0" @default.
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