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• W2036706723 startingPage "141" @default.
• W2036706723 abstract "Thin amorphous films of silicon and hydrogenated silicon were prepared by ion beam sputtering and evaporation with simultaneous hydrogen ion irradiation. The optical constants n and k were calculated over the visible region (400–700 nm). The results show the effect of hydrogen on the dispersion of n and k and the effects of ion beam irradiation on the adhesion of the films." @default.
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• W2036706723 date "1983-02-01" @default.
• W2036706723 modified "2023-10-02" @default.
• W2036706723 title "Optical properties of thin amorphous silicon and amorphous hydrogenated silicon films produced by ion beam techniques" @default.
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• W2036706723 doi "https://doi.org/10.1016/0040-6090(83)90469-8" @default.
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