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- W2036736710 abstract "The influence of growth conditions on reflection high-energy electron diffraction (RHEED) dampening and quantum well (QW) photoluminescence (PL) were studied. A set of GaAs/AlGaAs QW samples were grown at substrate temperatures between 580 and 660 °C while a second set of samples was grown at 620 °C as the As/Ga incorporation ratio was varied from 1.2 to 2.5. GaAs and AlGaAs RHEED oscillations were measured under the same growth conditions and fitted with a dampening constant. The As/Ga incorporation ratio study showed a clear correlation as both the RHEED dampening and the PL linewidths were found to increase with an increasing As/Ga ratio. The results for the substrate temperature study were more complex, as the PL linewidths were found to increase as the substrate temperature was decreased while the amount of RHEED dampening was found to be essentially constant." @default.
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- W2036736710 title "Molecular-beam epitaxial growth condition dependence of reflection high-energy electron diffraction dampening and quantum well photoluminescence" @default.
- W2036736710 doi "https://doi.org/10.1116/1.586790" @default.
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