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- W2036837577 abstract "Molybdenum–silicon multilayer (ML) x-ray mirrors have been fabricated using a direct-current planar magnetron sputtering system. The ML structure has been characterized using x-ray diffraction and high-resolution electron microscopy, and the normal incidence x-ray reflectivity has been measured using synchrotron radiation. A striking dependence of the ML morphology on the sputtering gas pressure is observed, exhibiting a transition from layer growth at lower pressures to columnar growth at higher pressures. Correspondingly, the normal incidence x-ray reflectivity is found to decrease strongly with increasing gas pressure. By depositing Mo–Si ML at low sputtering gas pressures we have achieved a normal incidence reflectivity as high as 61% at 132 Å." @default.
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- W2036837577 date "1991-09-01" @default.
- W2036837577 modified "2023-10-16" @default.
- W2036837577 title "Fabrication of high‐reflectance Mo–Si multilayer mirrors by planar‐magnetron sputtering" @default.
- W2036837577 doi "https://doi.org/10.1116/1.577221" @default.
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