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- W2036879596 abstract "Optical components for industrial excimer laser applications such as semiconductor lithography steppers have to withstand more than 10<SUP>10</SUP> laser pulses without suffering from significant cumulative absorption increase due to color center formation. Lithography lasers are now approaching pulse durations of 10 ns and repetition rates of 1000 Hz, a domain unexplored in previous degradation studies. With the aid of an optical pulse-extension unit and a modified laser resonator, we measured absorptance and absorption changes in Suprasil 312 UV-grade fused silica calorimetrically at pulse lengths of 7-73 ns. At 100 mJ/cm<SUP>2</SUP>, no degradation was detectable even after 500,000 pulses, but there was slight evidence of an absorption decrease due to laser cleaning. At 400 mJ/cm<SUP>2</SUP>, both absorptance and degradation rate increased towards shorter pulses and hence higher intensities, but even over the full pulse-length range, the changes remained moderate. Furthermore, degradation at 300 Hz was lower than at 150 Hz, indicating that a simultaneous bleaching effect might be involved which favors future high- repetition rate applications." @default.
- W2036879596 created "2016-06-24" @default.
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- W2036879596 date "1997-05-13" @default.
- W2036879596 modified "2023-09-23" @default.
- W2036879596 title "<title>Pulse-length dependence of absorptance and degradation rate of fused silica at 248 nm</title>" @default.
- W2036879596 doi "https://doi.org/10.1117/12.274232" @default.
- W2036879596 hasPublicationYear "1997" @default.
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