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• W2037048634 abstract "Abstract In the present work, a novel technique, “low energy ion implantation+high-energy heavy ion irradiation”, was used to synthesis light-emitting material. Experimentally, thermal-grown SiO 2 films were firstly implanted with 120 keV C + ions at room temperature (RT) to total doses in the range of (5.0×10 16 –1.0×10 18 ) ions/cm 2 . These C-doped SiO 2 films were then irradiated at RT with 335 and 855 MeV 40 Ar or 1.98 GeV 84 Kr ions to a fluence of 1.0×10 12 ions/cm 2 , or with 1.75 GeV 136 Xe ions to 1×10 11 , 5×10 11 or 1×10 12 ions/cm 2 , respectively. By measuring photoluminescence (PL) spectra of these samples excited by 320 nm light, the PL bands were investigated as functions of implantation ion dose, irradiation ion fluence and electronic energy loss S e . It was found that this technique is a useful tool to produce high quality light-emission structures, and that high-energy heavy ion irradiated C-doped SiO 2 films should be an efficient blue–violet emitting material. Furthermore, S e plays a dominant role in the formation of the PL bands, and proper C-dopant and suitable irradiation fluence will enhance the PL efficiency. Possible origins of the blue-violet PL bands formed in the ion irradiated C-doped SiO 2 films were discussed." @default.
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• W2037048634 date "2002-06-01" @default.
• W2037048634 modified "2023-10-06" @default.
• W2037048634 title "Swift heavy ion irradiation induced luminescence from C-doped SiO2 films" @default.
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• W2037048634 doi "https://doi.org/10.1016/s0168-583x(02)00887-x" @default.
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