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• W2037149342 abstract "In light of the need to simplify combination sputtering systems and to use them to fabricate thin-film electronic materials, we fabricated a Ta 2 O 5 solid electrolyte thin-film that exhibits superior ion conductivity by using combination sputtering with RF oxygen plasma irradiation. The formation of Ta 2 O 5 thin films using this technique was confirmed by Rutherford backscattering spectroscopy and the effectiveness of the resulting thin film as a solid electrolyte was demonstrated by its ion conductivity, which was determined by AC impedance measurement." @default.
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• W2037149342 date "2012-01-17" @default.
• W2037149342 modified "2023-10-10" @default.
• W2037149342 title "Ion Conductivity of Ta₂O₅ Solid Electrolyte Thin Film Prepared by Combination Sputtering with Radio Frequency Oxygen Plasma Irradiation" @default.
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• W2037149342 doi "https://doi.org/10.1143/jjap.51.025801" @default.
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