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• W2037177712 startingPage "256" @default.
• W2037177712 abstract "Kinetic roughening during thin film growth is a widely studied phenomenon, with many systems found to follow simple scaling laws. We show that for Cu electrodeposition from additive-free acid sulphate electrolyte, an extra scaling exponent is required to characterize the time evolution of the local roughness. The surface width w(l,t) scales as t(beta(loc))lH, when the deposition time t is large or the size l of the region over which w is measured is small, and as t(beta+beta(loc)) when l is large or t is small. This is the first report of such anomalous scaling for an experimental ( 2+1)-dimensional system. When the deposition current density or Cu concentration is varied, only beta(loc) changes, while the other power law exponents H and beta remain constant." @default.
• W2037177712 created "2016-06-24" @default.
• W2037177712 creator A5010372008 @default.
• W2037177712 creator A5080646577 @default.
• W2037177712 date "2001-01-08" @default.
• W2037177712 modified "2023-10-06" @default.
• W2037177712 title "Anomalous Scaling of the Surface Width during Cu Electrodeposition" @default.
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• W2037177712 doi "https://doi.org/10.1103/physrevlett.86.256" @default.
• W2037177712 hasPubMedId "https://pubmed.ncbi.nlm.nih.gov/11177805" @default.
• W2037177712 hasPublicationYear "2001" @default.
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