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- W2037425101 abstract "The typical performance index of microelectronics-grade filter products is based upon mechanical sieving. However, adsorption also plays a critical role for reducing certain defects. To provide a more accurate metric, a complementary adsorption performance index is introduced for lithography process filters. In this study, heptylamine-substituted palladium nanoparticles were used to simulate the adsorptive characteristics of microbridge defect precursors. Adsorption kinetic parameters were calculated for Nylon 6,6 and HDPE filters that were challenged with the simulation particles. Nylon 6,6 media quantitatively demonstrated superior adsorptive retention characteristics. The new index is expected to guide both filter product development and filter recommendation for next generation lithography processes." @default.
- W2037425101 created "2016-06-24" @default.
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- W2037425101 date "2013-03-29" @default.
- W2037425101 modified "2023-09-23" @default.
- W2037425101 title "Application specific ratings for lithography process filters" @default.
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- W2037425101 doi "https://doi.org/10.1117/12.2010735" @default.
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