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- W2037646514 abstract "A two-step method consisting of 1,3,5,7-tetramethycyclotetrasiloxane chemisorption and the postheating has formed a uniform and dense silica-like SiOx ultrathin layer (SiOx-UTL) on the surface of rutile TiO2. Diffuse reflectance infrared Fourier transform and solid-state 29Si NMR spectroscopy showed that three-dimensional Si−O−Si networks grow to become rigid by repeating the treatment. The coverage with the SiOx-UTL eliminates the surface acid sites, leading to an almost complete loss of the photocatalytic activity at the thicknesses above 0.36 ± 0.03 nm. On the basis of a tunneling model, the significant restriction of the photocatalytic activity can be accounted for by the excellent barrier effect of the SiOx-UTL for the photogenerated charge carrier transfer from TiO2 to acceptors in solution." @default.
- W2037646514 created "2016-06-24" @default.
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- W2037646514 date "2008-05-16" @default.
- W2037646514 modified "2023-10-16" @default.
- W2037646514 title "SiO<i><sub>x</sub></i> Ultrathin Layer Coverage Effect on the (Photo)catalytic Activities of Rutile TiO<sub>2</sub>" @default.
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- W2037646514 doi "https://doi.org/10.1021/jp801022m" @default.
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