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- W2037711832 abstract "The resistance fluctuations at a metal-semiconductor junction have been simulated as a function of the cross-sectional area of the contact at the interface. The fluctuations are due to the random spatial configurations of the dopants in the depletion region. The semiconductor is taken to be heavily doped n-GaAs. The conductance is computed over a square area. Dopings in the range of 1018–2.5×1019 cm−3 and square contacts with linear dimensions between 200 and 2000 Å are considered. An analysis of this problem yields the result that the standard deviation of the conductance of the contacts scales as 1/ln3/4, where n is the doping and l is the device size. From simulations, the relative fluctuations are found to fall significantly as the device sizes are increased beyond 1000 Å and as the doping is increased. The results of our simulations are found to agree with our scaling arguments." @default.
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- W2037711832 date "1988-05-15" @default.
- W2037711832 modified "2023-09-26" @default.
- W2037711832 title "Scale dependence of resistance fluctuations at metal‐semiconductor junctions" @default.
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- W2037711832 doi "https://doi.org/10.1063/1.340447" @default.
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