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• W2037718862 abstract "The swing curve is depending on the rotation speed of the spinner and the thickness of the photoresist. The thickness should be thick enough to prevent the unexposed area from being etched. It is also need to be uniform so that the image of the pattern to be developed later is in focus at all points on the resist surface. The variation of the photoresist thickness will impact the overall yield of the devices. In this respect, the photoresist thickness needs to be characterized carefully. Therefore, an experiment was set up to determine the right thickness and exposure time to control the critical dimension of the pattern. Photoresist coater and stepper are the main equipment used in this experiment. Positive photoresist is utilized as a pattern transfer medium and elipsometer is employed for film thickness measurement. 24 wafers are used in this experiment. The wafers are separated into 2 sets, each set which consists of 12 wafers have all the thickness variation. This to test the effect of standing resist before exposure and development to the dose-to-clear. The first set is coated, exposed and development. However, the second set is exposed and developed two days after being coated. After the wafer went through the standard cleaning procedure, the wafers were then coated using standard recipes which the spin speed ranging from 6500 to 7600 rpm in 100 rpm incremental with the designated rpm fro 1.2 μm photoresist thicknesses is in the middle. Subsequently, the photoresist thickness of each wafer is measured using elipsometer. Then, the exposure process is done by creating job that will expose the wafers in 20 by 10 arrays of small squares of open field with size 2×2 mm. The exposure is done in such a way where the exposure time will step up to the right and step down to the left from the center after each column. The center of the exposure energy time/step is 240/5. Then the graph is plotted to see the different. From the results we obtained that the minima for the dose-to-clear is at 7200 rpm where the thickness is 1.22 μm. whereby the first set and the second set of wafers produce a slight variation in clearing point." @default.
• W2037718862 created "2016-06-24" @default.
• W2037718862 creator A5017366245 @default.
• W2037718862 creator A5087438853 @default.
• W2037718862 date "2012-09-01" @default.
• W2037718862 modified "2023-09-26" @default.
• W2037718862 title "Statistical parameter evaluation for swing curves for the 1.2 &#x03BC;m and 1.8 &#x03BC;m resist thickness in CMOS photolithography process technology" @default.
• W2037718862 cites W1599780794 @default.
• W2037718862 cites W1981021334 @default.
• W2037718862 cites W2024716222 @default.
• W2037718862 cites W2029280925 @default.
• W2037718862 cites W2036653294 @default.
• W2037718862 cites W2043733717 @default.
• W2037718862 cites W2046217607 @default.
• W2037718862 cites W2047670952 @default.
• W2037718862 cites W2061929122 @default.
• W2037718862 cites W2073367532 @default.
• W2037718862 cites W2077543102 @default.
• W2037718862 cites W2082141465 @default.
• W2037718862 cites W2091725296 @default.
• W2037718862 cites W2095576264 @default.
• W2037718862 cites W2101290116 @default.
• W2037718862 cites W2104718512 @default.
• W2037718862 cites W2105249527 @default.
• W2037718862 cites W2106914397 @default.
• W2037718862 cites W2115053376 @default.
• W2037718862 cites W2115485724 @default.
• W2037718862 cites W2123438465 @default.
• W2037718862 cites W2483664965 @default.
• W2037718862 doi "https://doi.org/10.1109/icssbe.2012.6396571" @default.
• W2037718862 hasPublicationYear "2012" @default.
• W2037718862 type Work @default.
• W2037718862 sameAs 2037718862 @default.
• W2037718862 citedByCount "0" @default.
• W2037718862 crossrefType "proceedings-article" @default.
• W2037718862 hasAuthorship W2037718862A5017366245 @default.
• W2037718862 hasAuthorship W2037718862A5087438853 @default.
• W2037718862 hasConcept C105487726 @default.
• W2037718862 hasConcept C120665830 @default.
• W2037718862 hasConcept C121332964 @default.
• W2037718862 hasConcept C134406635 @default.
• W2037718862 hasConcept C160671074 @default.
• W2037718862 hasConcept C171250308 @default.
• W2037718862 hasConcept C187504802 @default.
• W2037718862 hasConcept C192562407 @default.
• W2037718862 hasConcept C207789793 @default.
• W2037718862 hasConcept C2779227376 @default.
• W2037718862 hasConcept C44445679 @default.
• W2037718862 hasConcept C49040817 @default.
• W2037718862 hasConcept C53524968 @default.
• W2037718862 hasConceptScore W2037718862C105487726 @default.
• W2037718862 hasConceptScore W2037718862C120665830 @default.
• W2037718862 hasConceptScore W2037718862C121332964 @default.
• W2037718862 hasConceptScore W2037718862C134406635 @default.
• W2037718862 hasConceptScore W2037718862C160671074 @default.
• W2037718862 hasConceptScore W2037718862C171250308 @default.
• W2037718862 hasConceptScore W2037718862C187504802 @default.
• W2037718862 hasConceptScore W2037718862C192562407 @default.
• W2037718862 hasConceptScore W2037718862C207789793 @default.
• W2037718862 hasConceptScore W2037718862C2779227376 @default.
• W2037718862 hasConceptScore W2037718862C44445679 @default.
• W2037718862 hasConceptScore W2037718862C49040817 @default.
• W2037718862 hasConceptScore W2037718862C53524968 @default.
• W2037718862 hasLocation W20377188621 @default.
• W2037718862 hasOpenAccess W2037718862 @default.
• W2037718862 hasPrimaryLocation W20377188621 @default.
• W2037718862 hasRelatedWork W1985404813 @default.
• W2037718862 hasRelatedWork W2157517379 @default.
• W2037718862 hasRelatedWork W2296840573 @default.
• W2037718862 hasRelatedWork W2406276998 @default.
• W2037718862 hasRelatedWork W2406681733 @default.
• W2037718862 hasRelatedWork W2772935202 @default.
• W2037718862 hasRelatedWork W2831809608 @default.
• W2037718862 hasRelatedWork W2837784159 @default.
• W2037718862 hasRelatedWork W2842040933 @default.
• W2037718862 hasRelatedWork W2850844588 @default.
• W2037718862 hasRelatedWork W2851656874 @default.
• W2037718862 hasRelatedWork W2856083003 @default.
• W2037718862 hasRelatedWork W2859123774 @default.
• W2037718862 hasRelatedWork W2867189345 @default.
• W2037718862 hasRelatedWork W2867782499 @default.
• W2037718862 hasRelatedWork W2870465584 @default.
• W2037718862 hasRelatedWork W2882846803 @default.
• W2037718862 hasRelatedWork W2956390180 @default.
• W2037718862 hasRelatedWork W2957983571 @default.
• W2037718862 hasRelatedWork W2961420874 @default.
• W2037718862 isParatext "false" @default.
• W2037718862 isRetracted "false" @default.
• W2037718862 magId "2037718862" @default.
• W2037718862 workType "article" @default.