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• W2037841750 abstract "Colloidal nanoparticles (NPs) can be deposited uniformly on flat or rough and uneven substrate surfaces employing a standard centrifuge and common solvents. This method is suitable for depositing different types of nanoparticles on a variety of substrates including glass, silicon wafer, aluminum foil, copper sheet, polymer film, plastic, and paper, etc. The thickness of the films can be controlled by the amount of the colloidal nanoparticle solution used in the preparation. The method offers a fast and simple procedure compared to other currently known nanoparticle deposition techniques for studying the optical properties of nanoparticle films." @default.
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• W2037841750 date "2014-07-25" @default.
• W2037841750 modified "2023-10-14" @default.
• W2037841750 title "Nanoparticle film deposition using a simple and fast centrifuge sedimentation method" @default.
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• W2037841750 doi "https://doi.org/10.1007/s13204-014-0338-x" @default.
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