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- W2037928829 abstract "We have investigated the formation of as-cast thin films of a poly(styrene-block-4-hydroxystyrene) (PS-b-PHOST) copolymer spin-coated directly on topographic prepattern substrates. Either wetting or dewetting of a polymer thin film on the elevated regions occurs in the nonequilibrium state during spin-coating with solvent vapor saturated and strongly depends on the dimensions of the prepatterns. The ratio of periodic unit area to elevated one of a prepattern (β value) is found as one of the most important factors for wettability of a thin film. The dewetting of a thin film, guided by the edges of either elevated individual periodic lines or mesas, took place with self-assembled block copolymer nanostructure when the β value was greater than a critical value of ∼4 in our system." @default.
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- W2037928829 date "2008-11-06" @default.
- W2037928829 modified "2023-09-25" @default.
- W2037928829 title "Thin Poly(styrene-<i>block</i>-4-hydroxystyrene) Block Copolymer Films Spin-Coated Directly on Topographic Prepattern Substrates" @default.
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- W2037928829 doi "https://doi.org/10.1021/ma801631y" @default.
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