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- W2037973071 abstract "Wet particle reduction during filter installation and start-up aligns closely with initiatives to reduce both chemicalconsumption and preventative maintenance time. The present study focuses on the effects of filter materials cleanlinesson wet particle defectivity through evaluation of filters that have been treated with a new enhanced cleaning processfocused on organic compounds reduction. Little difference in filter performance is observed between the two filter typesat a size detection threshold of 60 nm, while clear differences are observed at that of 26 nm. It can be suggested thatorganic compounds can be identified as a potential source of wet particles. Pall recommends filters that have beentreated with the special cleaning process for applications with a critical defect size of less than 60 nm. Standard filterproducts are capable to satisfy wet particle defect performance criteria in less critical lithography applications." @default.
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- W2037973071 date "2014-03-27" @default.
- W2037973071 modified "2023-09-23" @default.
- W2037973071 title "Wet particle source identification and reduction using a new filter cleaning process" @default.
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- W2037973071 doi "https://doi.org/10.1117/12.2046560" @default.
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