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- W2038156237 abstract "Hydrogen evolved continuously when wafers with atomically flat and hydrogen-terminated surfaces were immersed in aqueous 40% solution or oxygen-free water. The evolution of hydrogen was attributed to oxidative dissolution of silicon into the liquids. Although the dissolution rates were rather slow, the process could be sensitively traced by measuring the amount of hydrogen evolved. The rate of the hydrogen evolution was nearly proportional to the step densities existing on the surface, suggesting that silicon dissolves from the step edges. On the basis of the rates of hydrogen evolution and the densities of steps, we determined the receding speeds of the monohydride steps to be about 39 and in 40% solution and in oxygen-free water, respectively, at room temperature. Continuous hydrogen evolution was also observed when atomically flat wafers with dihydride steps were exposed to an inert gas containing water vapor." @default.
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- W2038156237 date "2006-01-01" @default.
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- W2038156237 title "Hydrogen Evolution from Atomically Flat Si(111) Surfaces Exposed to 40% NH[sub 4]F, Oxygen-Free Water, or Wet Gas" @default.
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- W2038156237 doi "https://doi.org/10.1149/1.2360767" @default.
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