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- W2038526449 abstract "This paper presents the results of investigations which have led to the batch fabrication of a new condenser microphone and the subsequent measurement of its characteristics. With an overall size of 3 × 4 × 0.8 mm3 including an hybrid JFET, the microphone has an integrated back-chamber and is achieved with a very simple IC-compatible process comprising only five photolithography steps. The diaphragm has a thickness of 1 μm. It is fabricated with the classical EDP boron etch-stop technique. Frequency responses of the microphone with a bias voltage of 20 V show sensitivities of 3.5 and 0.4 mV/Pa, depending on the fabrication parameters; the corresponding bandwidths are 2.5 and 20 kHz, respectively. Two methods of measurement have been set up in order to determine the built-in tension of heavily boron-doped silicon and have led to the same value of 70 MPa." @default.
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- W2038526449 date "1992-03-01" @default.
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- W2038526449 title "A new condenser microphone with a p+ silicon membrane" @default.
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- W2038526449 doi "https://doi.org/10.1016/0924-4247(92)80095-k" @default.
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