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• W2038548413 abstract "Abstract Dopant atoms segregate to SiO2/Si(001) interfaces. This causes problems during manufacture of submicron microelectronic devices. On the basis of ab initio calculations, we identify the physical mechanism by which P atoms are trapped and deactivated at SiO2/Si(001). We argue that segregation can occur to defected as well as to defect-free interfaces. In the latter case, the interfacial stress stabilizes pairs of threefold-coordinated phosphorus atoms. Implications for Complementary Metal-Oxide-Semiconductor (CMOS) process design are discussed." @default.
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• W2038548413 date "2000-03-01" @default.
• W2038548413 modified "2023-10-18" @default.
• W2038548413 title "Segregation of phosphorus to SiO2/Si(001) interfaces" @default.
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• W2038548413 doi "https://doi.org/10.1016/s1369-8001(00)00014-7" @default.
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