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- W2038683766 abstract "A variety of novolac-based polymers and blends with photoactive compounds were studied for their suitability as resists in a 193-nm positive-tone silylation process. The addition of photoactive compound was found to reduce the sensitivity of the resist and to hinder the diffusion of the silylating agent. Pure meta-cresol novolacs and polyvinylphenols, both of which can be polymerized to high (> 10,000) molecular weights show the best sensitivity for this process. Diffusion rates correlate with the molar volume of the silylating agent, although the activation energy does not. Resolution of 0.2-micrometers line-and-space gratings has been achieved with the polyvinylphenol and meta-cresol novolac resins." @default.
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- W2038683766 date "1991-06-01" @default.
- W2038683766 modified "2023-09-23" @default.
- W2038683766 title "<title>Evaluation of phenolic resists for 193 nm surface imaging</title>" @default.
- W2038683766 doi "https://doi.org/10.1117/12.46375" @default.
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