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- W2038806467 abstract "Metals with working functions in the middle of the bandgap of silicon are especially qualified as gate materials for nanometer scale transistors. Due to their high conductivity the doping step necessary for polysilicon layers can be omitted and one metal layer can be applied for both NMOS and PMOS transistors. In addition to this process simplification, the channel implantation can be reduced and thereby the matching of the transistor parameters increases. Using a deposition and backetching technique polysilicon and metal gates with linewidths below 100 nm have been processed with an excellent homogeneity over a 100-mm wafer." @default.
- W2038806467 created "2016-06-24" @default.
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- W2038806467 date "2002-07-01" @default.
- W2038806467 modified "2023-09-27" @default.
- W2038806467 title "Midbandgap materials for sub-100-nm MOS transistors" @default.
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- W2038806467 doi "https://doi.org/10.1016/s0167-9317(02)00581-6" @default.
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