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• W2038958963 abstract "We investigated the temperature dependence of C–V and I–V characteristics in p-type Metal Oxide Semiconductor (MOS) capacitors with HfO2/SiO2 dielectric stacks. Dramatic degradation in the C–V characteristics at/over the measurement temperature of 125 °C was observed, which was caused by the increased effective oxide thickness, oxide trapped charge density, and interfacial density of state (Dit) with rising temperature during bias temperature stress. In the accumulation region, the leakage current density displayed strong temperature dependence in the −3 V<Vg<0 V region, as expected for the direct tunneling compared to the trap-assisted component (DT+TAT) effect. The conduction mechanism was transformed into Fowler–Nordheim (FN) tunneling (weak T and Vg dependence) from DT+TAT (strong T and Vg dependence) at Vg <−3 V, which was confirmed by FN tunneling fitting. According to the conventional Shockley–Read–Hall model, the different levels in Dit were found at various measurement temperatures to interpret the strong temperature dependence and weak Vg dependence inversion current property." @default.
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• W2038958963 date "2013-10-01" @default.
• W2038958963 modified "2023-10-16" @default.
• W2038958963 title "Temperature dependence of electrical properties for MOS capacitor with HfO2/SiO2 gate dielectric stack" @default.
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• W2038958963 doi "https://doi.org/10.1016/j.mssp.2012.09.013" @default.
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