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• W2039018161 abstract "Bi0.9Nd0.1FeO3 (BNFO) films were deposited on Si (100) and (La,Sr)(Al,Ta)O3 (100) (LAST) substrate by radio frequency (RF) magnetron sputtering method respectively. The structure，morphology and magnetic properties were studied. X-ray diffraction (XRD) result indicates that the BNFO films on different substrate adopted different orientation. Cross-section scanning electron microscopy shows that the film thickness is 145 nm．Magnetic properties measurement shows that the film on Si(100) substrate has the larger saturation magnetization (Ms) of 3 686 emu/cm3, while the Ms value of the BNFO films on LSAT(100) substrate is only 1 213 emu/cm3." @default.
• W2039018161 created "2016-06-24" @default.
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• W2039018161 date "2013-02-01" @default.
• W2039018161 modified "2023-09-27" @default.
• W2039018161 title "Influence of Substrate on Structure and Magnetic Properties of Bi_0.9Nd_0.1FeO₃Thin Films by Radio Frequency Magnetron Sputtering Method" @default.
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• W2039018161 doi "https://doi.org/10.4028/www.scientific.net/amm.302.146" @default.
• W2039018161 hasPublicationYear "2013" @default.
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