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• W2039068705 abstract "Fabrication process for sharp waveguide bends in a two-dimensional photonic band gap structure in silicon is developed. The waveguide bend is defined by removing a row of pillars in a two-dimensional photonic crystal of 5 μm long, 205 nm diameter pillars placed on a square lattice with a pitch of 570 nm. To meet the severe nanotolerance requirements in such a device the SF6/O2 electron cyclotron resonance plasma process at reduced temperature is tailored to extreme profile control. The impact of main plasma parameters—i.e., temperature, oxygen/fluorine content, and ion energy—on the sidewall passivation process is unraveled in detail. Crystallographic orientation preference in the etch rate is observed." @default.
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• W2039068705 date "1999-11-01" @default.
• W2039068705 modified "2023-10-16" @default.
• W2039068705 title "Fabrication of two-dimensional photonic crystal waveguides for 1.5 μm in silicon by deep anisotropic dry etching" @default.
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• W2039068705 doi "https://doi.org/10.1116/1.591054" @default.
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