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- W2039149675 abstract "Diamond-like carbon (DLC) films were deposited on Si substrates using highly reproducible direct ion beam deposition from a RF inductively coupled hydrocarbon plasma source. Combinations of gases, such as C2H4 and C2H4–CH4, were used to form the plasma. The mechanical, electrical and optical properties of the films were examined as a function of the deposition conditions and CH4 content in gas mixture. Hard DLC films with a hardness up to 40 GPa were obtained. By variation of the C2H4/CH4 ratio, hardness of the films can be adjusted in the range 22–40 GPa. Highly reproducible deposition rates (<5% from run to run for over several 100 h) have been achieved. The deposition uniformity was within 5% over 9-inches round. For investigation of the bulk and surface electrically active defects (density, activation energies and capture cross-sections), charge-based deep-level transient spectroscopy (Q-DLTS) was used." @default.
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- W2039149675 date "2001-03-01" @default.
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- W2039149675 title "Direct ion beam deposition of hard (>30 GPa) diamond-like films from RF inductively coupled plasma source" @default.
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- W2039149675 doi "https://doi.org/10.1016/s0925-9635(00)00547-1" @default.
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