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• W2039152017 abstract "Charge transport in amorphous silicon (aSi) doped with ion implantation of Mn+, Ni+, Fe+, and Cu+ ions is studied using ESR technique, temperature dependence of conductivity σ(T), and thermopower α(T) measurements. With increasing of impurity (Mn, Ni, Fe) concentration (from 1018to 1019 cm−3) the localized state density and σ decrease owing to the passivation of silicon dangling bonds with impurity atoms. An analysis of conductivity and thermopower data allows to reveal three temperature regions. 1) At 250 < T < 500 K σ is due to holes excited from the acceptor impurity states. 2) At T > 500 K electron transport dominates. 3) At T < 250 K hopping conductivity with variable range hopping near Fermi level prevails. For a-Si:Mn in the region of 4 < T < 80 K Coulomb correlations are detected in the behaviour of σ(T). The Coulomb gap is foundto reach a maximum value 25 meV which appears to be one order of value larger than the known (one) in semiconductors doped with shallow impurity levels. [Russian Text Ignored]." @default.
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• W2039152017 date "1986-06-16" @default.
• W2039152017 modified "2023-09-26" @default.
• W2039152017 title "Transport phenomena in amorphous silicon doped by ion implantation of 3d metals" @default.
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• W2039152017 doi "https://doi.org/10.1002/pssa.2210950233" @default.
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