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• W2039176865 endingPage "085204" @default.
• W2039176865 startingPage "085204" @default.
• W2039176865 abstract "The degradation and roughening of polymers during plasma processing are important for the understanding of patterning of critical dimension features for both current and future lithographic techniques. Recently, the role of plasma-generated VUV photons in both the roughening and smoothing of current generation 193 nm photoresist (PR) has been investigated. However, a general understanding of the importance of polymer chemistry and structure on the degradation and roughening of polymers during plasma processing, which could be useful for polymer selection for next generation lithography, is currently lacking. Through the use of a beam system approach, the effects of ion bombardment and VUV radiation during plasma processing are investigated for two polymers with the same composition but different structure: poly(4-methyl styrene) (P4MS) and poly(α-methyl styrene) (PαMS). PαMS degrades under VUV radiation when heated above room temperature while P4MS is stable up to 70 °C, the maximum temperature studied. Both polymers undergo a drastic reduction in ion sputter yield at an ion fluence of 1 × 10 16 ions cm −2 , associated with the formation of a highly modified near-surface region. Almost no surface roughness is generated after VUV radiation, with moderate surface roughness formed on PαMS after ion bombardment at 70 °C. In contrast, extreme levels of surface roughness (∼10 nm rms) are observed for PαMS after simultaneous exposure to VUV photons and ion bombardment at 70 °C. Similarities to the synergistic roughening of current generation 193 nm PR under simultaneous VUV photons and ion bombardment are discussed." @default.
• W2039176865 created "2016-06-24" @default.
• W2039176865 creator A5011909715 @default.
• W2039176865 creator A5013552076 @default.
• W2039176865 creator A5024630942 @default.
• W2039176865 creator A5024885321 @default.
• W2039176865 creator A5027381116 @default.
• W2039176865 creator A5059727002 @default.
• W2039176865 creator A5068872407 @default.
• W2039176865 creator A5077850920 @default.
• W2039176865 creator A5078166834 @default.
• W2039176865 creator A5088251109 @default.
• W2039176865 date "2010-02-12" @default.
• W2039176865 modified "2023-09-27" @default.
• W2039176865 title "Role of polymer structure and ceiling temperature in polymer roughening and degradation during plasma processing: a beam system study of P4MS and PαMS" @default.
• W2039176865 cites W1612694341 @default.
• W2039176865 cites W1964554402 @default.
• W2039176865 cites W1978694105 @default.
• W2039176865 cites W1982693075 @default.
• W2039176865 cites W1982850149 @default.
• W2039176865 cites W1985417987 @default.
• W2039176865 cites W1985532196 @default.
• W2039176865 cites W2003958703 @default.
• W2039176865 cites W2004691832 @default.
• W2039176865 cites W2010702696 @default.
• W2039176865 cites W2049762492 @default.
• W2039176865 cites W2051089287 @default.
• W2039176865 cites W2053891473 @default.
• W2039176865 cites W2066806195 @default.
• W2039176865 cites W2078639662 @default.
• W2039176865 cites W2081244818 @default.
• W2039176865 cites W2090939220 @default.
• W2039176865 cites W2126726585 @default.
• W2039176865 cites W2145930691 @default.
• W2039176865 cites W2147166722 @default.
• W2039176865 doi "https://doi.org/10.1088/0022-3727/43/8/085204" @default.
• W2039176865 hasPublicationYear "2010" @default.
• W2039176865 type Work @default.
• W2039176865 sameAs 2039176865 @default.
• W2039176865 citedByCount "14" @default.
• W2039176865 countsByYear W20391768652012 @default.
• W2039176865 countsByYear W20391768652014 @default.
• W2039176865 countsByYear W20391768652017 @default.
• W2039176865 countsByYear W20391768652020 @default.
• W2039176865 countsByYear W20391768652022 @default.
• W2039176865 crossrefType "journal-article" @default.
• W2039176865 hasAuthorship W2039176865A5011909715 @default.
• W2039176865 hasAuthorship W2039176865A5013552076 @default.
• W2039176865 hasAuthorship W2039176865A5024630942 @default.
• W2039176865 hasAuthorship W2039176865A5024885321 @default.
• W2039176865 hasAuthorship W2039176865A5027381116 @default.
• W2039176865 hasAuthorship W2039176865A5059727002 @default.
• W2039176865 hasAuthorship W2039176865A5068872407 @default.
• W2039176865 hasAuthorship W2039176865A5077850920 @default.
• W2039176865 hasAuthorship W2039176865A5078166834 @default.
• W2039176865 hasAuthorship W2039176865A5088251109 @default.
• W2039176865 hasConcept C107365816 @default.
• W2039176865 hasConcept C111337013 @default.
• W2039176865 hasConcept C113196181 @default.
• W2039176865 hasConcept C121332964 @default.
• W2039176865 hasConcept C134406635 @default.
• W2039176865 hasConcept C145148216 @default.
• W2039176865 hasConcept C159985019 @default.
• W2039176865 hasConcept C171250308 @default.
• W2039176865 hasConcept C178790620 @default.
• W2039176865 hasConcept C185544564 @default.
• W2039176865 hasConcept C185592680 @default.
• W2039176865 hasConcept C192562407 @default.
• W2039176865 hasConcept C22078206 @default.
• W2039176865 hasConcept C2779227376 @default.
• W2039176865 hasConcept C50774322 @default.
• W2039176865 hasConcept C521977710 @default.
• W2039176865 hasConcept C62520636 @default.
• W2039176865 hasConcept C71039073 @default.
• W2039176865 hasConcept C82706917 @default.
• W2039176865 hasConceptScore W2039176865C107365816 @default.
• W2039176865 hasConceptScore W2039176865C111337013 @default.
• W2039176865 hasConceptScore W2039176865C113196181 @default.
• W2039176865 hasConceptScore W2039176865C121332964 @default.
• W2039176865 hasConceptScore W2039176865C134406635 @default.
• W2039176865 hasConceptScore W2039176865C145148216 @default.
• W2039176865 hasConceptScore W2039176865C159985019 @default.
• W2039176865 hasConceptScore W2039176865C171250308 @default.
• W2039176865 hasConceptScore W2039176865C178790620 @default.
• W2039176865 hasConceptScore W2039176865C185544564 @default.
• W2039176865 hasConceptScore W2039176865C185592680 @default.
• W2039176865 hasConceptScore W2039176865C192562407 @default.
• W2039176865 hasConceptScore W2039176865C22078206 @default.
• W2039176865 hasConceptScore W2039176865C2779227376 @default.
• W2039176865 hasConceptScore W2039176865C50774322 @default.
• W2039176865 hasConceptScore W2039176865C521977710 @default.
• W2039176865 hasConceptScore W2039176865C62520636 @default.
• W2039176865 hasConceptScore W2039176865C71039073 @default.
• W2039176865 hasConceptScore W2039176865C82706917 @default.
• W2039176865 hasIssue "8" @default.
• W2039176865 hasLocation W20391768651 @default.
• W2039176865 hasOpenAccess W2039176865 @default.
• W2039176865 hasPrimaryLocation W20391768651 @default.

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