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- W2039356108 abstract "The dependence of surface polarity in step-controlled epitaxy of 6H- and 4H-SiC polytypes on off-oriented (001) substrates was examined. Dominant step heights correspond to half (6H-) or a full (4H-) unit cells of the SiC polytypes. The background doping level can be reduced to less than 1 × 1014 per cm3 by growth under C-rich conditions. High electron mobilities of 431 cm2 Vs−1 for 6H-SiC and 851 cm2 Vs−1 for 4H-SiC were obtained. The high quality of the epilayers was also elucidated, since the deep trap concentration detected by deep level analysis was in the order of 1012 per cm3. The surface polarity dependence and polytype dependence of impurity doping were demonstrated." @default.
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- W2039356108 date "1997-08-01" @default.
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- W2039356108 title "Surface polarity dependence in step-controlled epitaxy: progress in SiC epitaxy" @default.
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- W2039356108 doi "https://doi.org/10.1016/s0925-9635(97)00104-0" @default.
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