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- W2039447410 abstract "Abstract Conditions leading to cobalt–molybdenum (Co–Mo) electrodeposits with high Mo percentages were studied. Deposits prepared by means of direct current electroplating showed a large amount of cracks. Maximum amount of Mo in the films was attained by applying deposition potentials in the − 1200 mV to − 1300 mV range. Reverse pulse plating mode has been proved useful for obtaining nanocrystalline, low stressed Co–Mo deposits with similar Mo percentages as in direct current conditions (35–40 wt.%). The coatings were exposed to a static microindentation test, which highlighted that the pulse plated samples were more compact and less fragile than the direct current plated ones." @default.
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- W2039447410 date "2006-12-01" @default.
- W2039447410 modified "2023-09-26" @default.
- W2039447410 title "Use of the reverse pulse plating method to improve the properties of cobalt–molybdenum electrodeposits" @default.
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- W2039447410 doi "https://doi.org/10.1016/j.surfcoat.2006.04.011" @default.
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