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- W2039607413 abstract "Abstract The Al and Ag films made by IVD were significantly modified in both mechanical and electrical properties. The cause lies in the deposition parameters: bombardment energy and ion/atom arrival rate ratio. It was found that the Al film hardness, the AlSi contact resistivity and the AlSi adhesion were improved in the deposition range: energy 250–500 eV and arrival ratio 0.06–0.10." @default.
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- W2039607413 date "1989-01-01" @default.
- W2039607413 modified "2023-09-25" @default.
- W2039607413 title "Formation of Ag/Si and Al/Si films by ion assisted deposition" @default.
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- W2039607413 doi "https://doi.org/10.1016/0042-207x(89)90256-x" @default.
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